Boots – shoes – and leggings
Patent
1994-03-22
1998-05-19
Cosimano, Edward R.
Boots, shoes, and leggings
25049222, G06F 1700
Patent
active
057544433
ABSTRACT:
A method for processing exposure data corresponding to a pattern formed on a wafer includes the steps of (a) generating electron dose data relating to exposure per each pattern in an area to be exposed, (b) calculating exposure distance data which shows a degree to correct the electron dose data based on positional relations of each pattern as a pattern to be corrected in sequence with patterns in a predetermined range in the periphery thereof, based on the electron dose data determined by the step (a), (c) correcting the electron dose data determined by the step (a) with the exposure distance data determined by the step (b) to generate corrected electron dose data of each pattern, and (d) calculating an irradiation amount of each pattern based on the corrected electron dose data.
REFERENCES:
patent: 4426584 (1984-01-01), Bohlen et al.
patent: 4504558 (1985-03-01), Bohlen et al.
patent: 4520269 (1985-05-01), Jones
patent: 4789945 (1988-12-01), Niijima
patent: 5008553 (1991-04-01), Abe
patent: 5051598 (1991-09-01), Ashton et al.
patent: 5082762 (1992-01-01), Takahashi
patent: 5086398 (1992-02-01), Moriizumi
patent: 5182718 (1993-01-01), Harafuji et al.
patent: 5210696 (1993-05-01), Yano
patent: 5253182 (1993-10-01), Suzuki
patent: 5432714 (1995-07-01), Chung et al.
patent: 5438207 (1995-08-01), Itoh et al.
patent: 5451487 (1995-09-01), Abe et al.
Cosimano Edward R.
Fujitsu Limited
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