Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1992-08-28

1993-11-23

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 71, G03B 2742, G03B 2754

Patent

active

052648982

ABSTRACT:
A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mask onto the surface of a wafer, and an aperture member which is interposed between the light source and the light condensing optical system. The aperture member has a light transmission region for transmitting the light from the light source and a light-interrupting member disposed to extend across the light transmission region. The shape or configuration of the light-interrupting member is determined in accordance with the geometry of the circuit pattern formed on the mask.

REFERENCES:
patent: 4619508 (1986-10-01), Shibuya et al.
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5160962 (1992-11-01), Miura et al.
patent: 5208818 (1993-05-01), Gelbart et al.

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