Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-05-24
1998-05-19
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430170, 430192, 4302701, G03F 7023
Patent
active
057534071
ABSTRACT:
Disclosed herein is a polyamic acid composition which comprises an aromatic carboxylic acid compound having phenolic hydroxyl groups, polyamic acid, and a photosensitizer made of a diazide compound, and which can form a polyimide film pattern having a high resolution and capable of firmly adhering to a substrate.
REFERENCES:
patent: 5011753 (1991-04-01), Mueller et al.
patent: 5182183 (1993-01-01), Tomiyasa
patent: 5238784 (1993-08-01), Tokoh et al.
patent: 5342739 (1994-08-01), Katan et al.
Kabushiki Kaisha Toshiba
Young Christopher G.
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