Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1998-08-14
2000-06-20
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
060776315
ABSTRACT:
A scanning type exposure apparatus includes an illumination device for Illuminating a mask, a projection device for projecting a pattern of the mask onto a substrate and a scanning device for scanning, in a scanning direction, the mask and the substrate relative to the illumination device and the projection device, respectively. The projection device includes a stop device for setting an effective numerical aperture in the scanning direction to be larger than an effective numerical aperture in a direction perpendicular to the scanning direction. Also disclosed are various photomasks, as well as a scanning type exposure apparatus which scans and exposes a substrate by using such photomasks and a device manufacturing method that includes a step of transferring a device pattern onto a substrate by using such photomasks.
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M. Noguchi, et al., "Subhalf Micron Lithography System With Phase-Shifting Effect", SPIE, vol. 1674, Optical/Laser Microlithography V (1992), pp. 92-104.
Canon Kabushiki Kaisha
Rosasco S.
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