Method and apparatus for inert gas purging/temperature control f

Details Method and apparatus for inert gas purging/temperature control f Method and apparatus for inert gas purging/temperature control f

1998-06-01

2000-06-20

Hail, III, Joseph J.

Solid material comminution or disintegration

Processes

With application of fluid or lubricant material

241 31, 241 33, 241 48, 241DIG37, B02C 2500

Patent

active

060767529

ABSTRACT:
In a grinding/pulverizing system the combustion of the material being processed is avoided by grinding or pulverizing the material at temperatures below the combustion temperature of the material, and/or in an atmosphere of reduced oxygen level incapable of supporting combustion of the material at the processing temperature.

REFERENCES:
patent: 3610594 (1971-10-01), Williams
patent: 3734412 (1973-05-01), Haas et al.
patent: 3771729 (1973-11-01), Frable
patent: 3785577 (1974-01-01), Carlsmith et al.
patent: 3921917 (1975-11-01), Meinass
patent: 4102503 (1978-07-01), Meinass
patent: 4273294 (1981-06-01), Hollely et al.
patent: 4304360 (1981-12-01), Luhr et al.
patent: 4428535 (1984-01-01), Venetucci
patent: 4687672 (1987-08-01), Vitkovski
patent: 4776173 (1988-10-01), Kamarei et al.
patent: 4778113 (1988-10-01), Jewett et al.
patent: 4846410 (1989-07-01), Jewett et al.
patent: 5011087 (1991-04-01), Richardson et al.
patent: 5022328 (1991-06-01), Robertson
patent: 5137218 (1992-08-01), Sutherland et al.
patent: 5203511 (1993-04-01), Ondush et al.
patent: 5233932 (1993-08-01), Robertson
patent: 5597123 (1997-01-01), Steigman et al.

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