High pressure plasma hydrogenation of silicon tetrachloride

Details High pressure plasma hydrogenation of silicon tetrachloride High pressure plasma hydrogenation of silicon tetrachloride

1980-05-09

1982-01-05

Cooper, Jack

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

423342, 423DIG10, C01B 33107

Patent

active

043092594

ABSTRACT:
A method is disclosed for the plasma hydrogenation of silicon tetrachloride. A high pressure plasma is utilized to effect a reaction of hydrogen and silicon tetrachloride to form trichlorosilane and other hydrogenated silicon chlorides.

REFERENCES:
patent: 3840750 (1974-10-01), Davis et al.
patent: 3933985 (1976-01-01), Rodgers
patent: 4102985 (1978-07-01), Harvey

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