Process for forming large silica spheres by low temperature nucl

Details Process for forming large silica spheres by low temperature nucl Process for forming large silica spheres by low temperature nucl

1993-09-17

1995-06-20

Straub, Gary P.

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423335, C01B 3312

Patent

active

054259304

ABSTRACT:
A process for producing microspheres of silica having a maximum diameter of at least 2.5 .mu.m particularly about 2.5 .mu.m to 10 .mu.m from the hydrolysis of a silica precursor, such as a tetraalkoxysilane, which is characterized by employing precursor solutions and feed rates which initially yield a two-phase reaction mixture and beginning the hydrolysis reaction with solutions cooled below ambient temperatures, preferably below about 10.degree. C. Either monodisperse or polydisperse microspheres may be formed.

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patent: 5089554 (1992-02-01), Bomo et al.
Stober et al., "Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range", Jour. of Colloid & Interface Sci., 26, 62-69 (1968).

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