Gas seal and support for rotating semiconductor processor

Details Gas seal and support for rotating semiconductor processor Gas seal and support for rotating semiconductor processor

1998-03-17

2000-10-03

Ferensic, Denise L.

Drying and gas or vapor contact with solids

Process

By centrifugal force

34 58, 34242, F26B 508

Patent

active

061255513

ABSTRACT:
A rotating wafer processor uses a non-contacting gas seal mounted to a process chamber and a vibration isolation mount between the chamber and a support structure. The non-contacting seal incorporates a housing with a chamfer on opposing ends of an annular land encircling a rotating drive shaft, and one or more outlet ports on the chamfers to form a gas-purged, noncontacting seal. The seal is directly mounted to the chamber and interposed between the chamber and bearings that support the drive shaft, so the shaft, chamber and rotating load vibrate together.

REFERENCES:
patent: 3347604 (1967-10-01), Lavelle et al.
patent: 3383255 (1968-05-01), Rossi et al.
patent: 3489608 (1970-01-01), Jacobs et al.
patent: 3760822 (1973-09-01), Evans
patent: 3808065 (1974-04-01), Robinson et al.
patent: 3964957 (1976-06-01), Walsh
patent: 3970471 (1976-07-01), Bankes et al.
patent: 3974797 (1976-08-01), Hutson
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4092176 (1978-05-01), Kozai et al.
patent: 4099727 (1978-07-01), Weiler
patent: 4132567 (1979-01-01), Blackwood
patent: 4197000 (1980-04-01), Blackwood
patent: 4199154 (1980-04-01), Mueller
patent: 4300581 (1981-11-01), Thompson
patent: 4571850 (1986-02-01), Hunt et al.
patent: 4884899 (1989-12-01), Schwartzman
patent: 5022419 (1991-06-01), Thompson et al.
patent: 5171026 (1992-12-01), Starrick
patent: 5339539 (1994-08-01), Shiraishi et al.
Verteq, Inc., Spin Dryers brochure, Mar. 1997: SuperClean 8201.
Tempress Microelectronics, Installation and Service Manual: Model 425.

Affiliated with

Also associated with

Rating

Gas seal and support for rotating semiconductor processor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas seal and support for rotating semiconductor processor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas seal and support for rotating semiconductor processor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-184092