Pattern defect inspecting apparatus

Details Pattern defect inspecting apparatus Pattern defect inspecting apparatus

1997-05-12

2000-05-23

Font, Frank G.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356394, G06K 946

Patent

active

06067153&

ABSTRACT:
A high-speed pattern defect inspecting apparatus with a high sensitivity and less erroneous detection. In the pattern defect inspecting apparatus, a wafer is scanned by an electron beam, secondary electron signal generated by the scanning is stored in an image memory, and the stored image is used to cause a display unit to be subjected to a brightness modulation. A reference pattern image previously stored in the image memory is compared with a detected wafer pattern image to find a difference between the both images, and the difference is detected as a defect in a wafer pattern. The wafer scanning of the electron beam is carried out only for an arbitrary specified part thereon.

REFERENCES:
patent: 5576833 (1996-11-01), Miyoshi et al.

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