Method of making crystal films

Details Method of making crystal films Method of making crystal films

1975-06-13

1976-10-26

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204298, C23C 1500

Patent

active

039882322

ABSTRACT:
A crystal film such as a piezoelectric crystal film is formed by sputtering of source material which is in the form of a convex curved surface or a polyhedral surface, and the formed film has crystallographic properties which can be very well controlled.

REFERENCES:
patent: 3420763 (1969-01-01), Polito et al.
patent: 3528902 (1970-09-01), Wasa et al.
patent: 3558351 (1971-01-01), Foster
patent: 3669871 (1972-06-01), Elmgren et al.
patent: 3766041 (1973-10-01), Wasa et al.
T. Hada et al, "Structures & Electrical Properties of Zinc Oxide Films Prepared by Low Pressure Sputtering System", Thin Solid Films, vol. 7, pp. 135-145 (1971).

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