Silicon nitride sintered body having excellent high-temperature

Details Silicon nitride sintered body having excellent high-temperature Silicon nitride sintered body having excellent high-temperature

1990-12-24

1992-02-18

Group, Karl

Compositions: ceramic

Ceramic compositions

Refractory

501 98, 264 65, C04B 3558

Patent

active

050894480

ABSTRACT:
A silicon nitride sintered body having a composition of 1.5-3.0 weight % of Y.sub.2 O.sub.3, 0.1-1.0 weight % of Al.sub.2 O.sub.3 and balance substantially Si.sub.3 N.sub.4, a weight ratio of Y.sub.2 O.sub.3 /Al.sub.2 O.sub.3 being 2.5 or more, which has a density of 3.0 g/cm.sup.3 or more and has a structure in which the minor axes of grains are substantially 6 .mu.m or less. This silicon nitride sintered body is produced by preparing a powder mixture containing Y.sub.2 O.sub.3 powder, Al.sub.2 O.sub.3 powder and silicon nitride powder in the above proportions, the silicon nitride powder having an oxygen content of 1.2 weight % or less, a specific surface area of 9-11 m.sup.2 /g and a metal impurity content of 200 ppm or less; and sintering the powder mixture at a temperature of 1900.degree.-2100.degree. C. and a pressure of 5 kg/cm.sup.2 G or more in a nitrogen atmosphere.

REFERENCES:
patent: 4511402 (1985-04-01), Miura et al.
patent: 4511525 (1985-04-01), Tsuge et al.
patent: 4517168 (1985-05-01), Kawahito et al.
patent: 4769350 (1988-09-01), Nishioka et al.
patent: 4883776 (1989-11-01), Pyzik et al.
patent: 4904624 (1990-02-01), Yeckley
patent: 4908171 (1990-03-01), Clausson
patent: 4980322 (1990-12-01), Wickel et al.

Affiliated with

Also associated with

Rating

Silicon nitride sintered body having excellent high-temperature does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon nitride sintered body having excellent high-temperature , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon nitride sintered body having excellent high-temperature will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1823419