Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1990-08-17
1992-02-18
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430314, 430316, 430318, 430323, 430324, 156643, 156656, 1566591, 156904, G03F 100, G03F 726
Patent
active
050893610
ABSTRACT:
A method for making lithographic masks using a soda lime glass substrate that is useful particularly in the manufacture of near submicron and submicron integrated circuits. The problem of "mouse nipping" at the edges of the chromium metal and chromium oxide mask lines is overcome by using a very thin high molecular weight coating under the standard resist layer and over the chromium oxide layer.
REFERENCES:
patent: 3715244 (1973-02-01), Szupillo
patent: 3729316 (1973-04-01), Castrucci et al.
patent: 4363846 (1982-12-01), Kaneki
patent: 4489146 (1984-12-01), Bock et al.
Bowers Jr. Charles L.
Duda Kathleen
Industrial Technology Research Institute
Saile George O.
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