Method of fabricating gallium arsenide burris FET structure for

Metal working – Method of mechanical manufacture – Assembling or joining

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29571, 156628, 156655, 156662, H01L 21283, H01L 21308

Patent

active

044160534

ABSTRACT:
A GaAs FET structure with a high electric field region, or active region, contacted by source, gate and drain electrodes is provided which can be used for high speed optical detection or for microwave oscillator optical injection locking. The device provides for efficient coupling of optical radiation into the active region through an opening in a semi-insulating substrate used to support the device. A buffer layer between the active region and the substrate prevents leakage current to the substrate, permits a larger illumination window for improved optical coupling and provides mechanical support for the FET detector. GaAs photodetectors are also provided by eliminating the gate electrode.

REFERENCES:
patent: 3651423 (1972-03-01), Sewell
patent: 3662289 (1972-05-01), Dienst
patent: 3767494 (1973-10-01), Muroaka et al.
patent: 3801391 (1974-04-01), Dyment et al.
patent: 3959037 (1976-05-01), Gutierrez et al.
patent: 4019082 (1977-04-01), Olsen
patent: 4127862 (1978-11-01), Ilegema et al.
patent: 4157556 (1979-06-01), Decker et al.
patent: 4176367 (1979-11-01), Uematsu
patent: 4360246 (1982-11-01), Figueroa et al.
Pan et al., "GaAs . . . Detection" 22nd SPIE International Technical Symposium, San Diego, Ca. (8/28/78), pp. 1-9.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of fabricating gallium arsenide burris FET structure for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of fabricating gallium arsenide burris FET structure for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of fabricating gallium arsenide burris FET structure for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1809202

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.