Method for manufacturing a BiCMOS device

Fishing – trapping – and vermin destroying

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148DIG37, 148DIG82, 148DIG124, 357 42, 357 43, 437 59, 437 76, 437162, 437168, 437186, 437913, 437954, H01L 2978, H01L 21225

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048187208

ABSTRACT:
A semiconductor integrated circuit device is disclosed which comprises a bipolar transistor and a field effect transistor, in which a gate electrode of the field effect transistor and a collector electrode of the bipolar transistor are formed from a common electrode layer of a high impurity concentration, and in which the collector region of the bipolar transistor comprises a region of a high impurity concentration having a conductivity type the same as that of the collector region of the bipolar transistor.

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patent: 4525922 (1985-07-01), Kiriseko
patent: 4590666 (1986-05-01), Goto
Sorab K. Ghandhi, "VLSI Fabrication Principles", John Wiley & Sons, New York, NY, 1983, pp. 170-171.
N. G. Anantha et al, IBM Technical Disclosure Bulletin, vol. 23, No. 1, Jun. 1980, "Method for Making Self-Aligned Mesfets with Process Compatible with NPN Transistors", pp. 167-169.
Castrucci et al., "Bipolar/FET High-Performance Circuit," IBM Technical Disclosure Bulletin, vol. 16, No. 8, Jan. 1974.

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