Low frequency plasma spray method in which a stable plasma is cr

Details Low frequency plasma spray method in which a stable plasma is cr Low frequency plasma spray method in which a stable plasma is cr

1990-05-17

1992-06-09

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427422, 21912138, B05D 100

Patent

active

051205670

ABSTRACT:
A low frequency RF plasma spray deposition method is provided, which is especially effective in reducing losses and improving particle heating. In one aspect of the invention, an RF plasma gun is operated in the frequency range below 1 MHz and an argon-helium mixture to which a third component, such as hydrogen, can also be admixed, is substituted for the standard argon-hydrogen mixture used at frequencies above 2 MHz. In another aspect of the invention, a RF plasma gun is operated in the frequency range of 400-500 kHz and specific start up and operating procedures and conditions are set forth for successful deposition of titanium and refractory metal alloys.

REFERENCES:
patent: 4805833 (1989-02-01), Seimers
patent: 4902870 (1990-02-01), Frind et al.

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