Method for etching a flat apertured mask for use in a cathode-ra

Details Method for etching a flat apertured mask for use in a cathode-ra Method for etching a flat apertured mask for use in a cathode-ra

1985-12-23

1987-05-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

430 5, 430 24, 430274, 430323, 430325, 430950, 430961, 313402, 313403, G03C 500, H01J 2906, H01J 2907

Patent

active

046649964

ABSTRACT:
A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.

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