Thin-film deposition

Details Thin-film deposition Thin-film deposition

1980-04-15

1983-02-15

Lusignan, Michael R.

Coating processes

Coating by vapor, gas, or smoke

427 42, 427 451, 427 50, 427124, 427250, 427294, 427295, 427296, 427421, 427422, C23C 1300

Patent

active

043741622

ABSTRACT:
A material is introduced into and heated within a crucible of the sealed type for vaporization purposes and the crucible includes an ejection nozzle. The vapor of the material is then ejected through the nozzle into a vacuum region to strike onto a substrate, the pressure of the vacuum region being selected to be at least 1/100 times as low as the vapor pressure within the crucible and of approximately 10.sup.-2 Torr or less. Change in ejection velocity provide control of fine structures of films when being deposited on the substrate.

REFERENCES:
patent: 2074281 (1937-03-01), Sommer
patent: 2242101 (1941-05-01), Allee
patent: 2273941 (1942-02-01), Dorn
patent: 2440135 (1948-04-01), Alexander
patent: 3352713 (1967-11-01), Schoffer et al.
patent: 4227961 (1980-10-01), Takagi

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