Exposure system including a device for analyzing an affect of a

Details Exposure system including a device for analyzing an affect of a Exposure system including a device for analyzing an affect of a

1991-03-26

1992-06-09

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, 353 53, G01B 1100

Patent

active

051201348

ABSTRACT:
An exposure system for exposing a wafer coated with a resist to a mask is disclosed. The system includes a photoelectric converting device for photoelectrically converting, through a detection optical system, an alignment mark formed on the wafer; an analyzing device for analyzing an affect of the resist on the wafer to a mark signal from the photoelectric converting device; and a control device for controlling the position of the wafer in relation to the mask, by using the mark signal from the photoelectric converting device and a result of analysis by the analyzing device.

REFERENCES:
patent: 4795261 (1989-01-01), Nakata et al.
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 4886974 (1989-12-01), Ina
patent: 4906852 (1990-03-01), Nakata et al.
patent: 4952060 (1990-08-01), Ina et al.
patent: 4962318 (1990-10-01), Nishi
patent: 4971444 (1990-11-01), Kato
Kuniyoshi, et al., "Contrast Improvement of Alignment Signals from Resist Coated Patterns," J. Vac. Sci. Technol., Mar./Apr. 1987, pp. 555-560.

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