Plasma CVD apparatus and method therefor

Details Plasma CVD apparatus and method therefor Plasma CVD apparatus and method therefor

1993-03-12

1994-11-01

Kwon, John T.

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 31511121, 20429801, C23C 1600

Patent

active

053604830

ABSTRACT:
A plasma CVD apparatus for continuously forming a diamond-like film on a length of magnetic tape, includes a first vacuum vessel, a plasma generating vessel for transforming a gaseous medium into a plasma, and an electrode for accelerating ions of the plasma toward the substrate. The plasma generating vessel has a gas outflow port of a shape complementary to that of the portion of the magnetic tape readied for deposition. A portion of the plasma generating vessel is disposed within the vacuum vessel, with the gas outflow port facing the substrate. A gap between the substrate and the gas outflow port is set to maintain the pressure of plasma in the gap uniform.

REFERENCES:
patent: 3898952 (1975-08-01), Shirahata et al.
patent: 4301765 (1981-11-01), Behn et al.
patent: 4645977 (1987-02-01), Kurokawa et al.
patent: 4647818 (1987-03-01), Ham
patent: 4655167 (1987-04-01), Nakamura et al.
patent: 4673588 (1987-06-01), Bringmann et al.
patent: 4863756 (1989-09-01), Hartig et al.
patent: 5110437 (1992-05-01), Yamada et al.

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