Catadioptric optical reduction system with high numerical apertu

Optical: systems and elements – Lens – With reflecting element

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359631, G02B 1700

Patent

active

055372600

ABSTRACT:
A catadioptric optical reduction system for use in the photolithographic manufacture of semiconductors having a concave mirror operating near unit magnification, or close to a concentric condition. A lens group before the mirror provides only enough power to image the entrance pupil at infinity to the aperture stop at or near the concave mirror. A lens group after the mirror provides a larger proportion of reduction from object to image size, as well as projecting the aperture stop to an infinite exit pupil. An aspheric concave mirror is used to further reduce high order aberrations. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.35 microns over a 26.times.5 millimeter field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine glasses of different refracting power to widen the spectral bandwidth which can be achieved.

REFERENCES:
patent: 3917399 (1975-11-01), Buzawa et al.
patent: 4896952 (1990-01-01), Rosenbluth
patent: 4953960 (1990-09-01), Williamson
patent: 5089913 (1992-02-01), Singh et al.
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5220454 (1993-06-01), Ichihara et al.

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