Process for the preparation of fatty acid alkyl esters having im

Details Process for the preparation of fatty acid alkyl esters having im Process for the preparation of fatty acid alkyl esters having im

1985-06-26

1987-03-17

Sneed, Helen M. S.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

260419, C11C 302, C11C 108

Patent

active

046506110

ABSTRACT:
Lower alkyl esters of higher fatty acids with improved processing properties, particularly sulfonation, are obtained by subjecting lower alkyl esters of higher fatty acids of plant and/or animal origin, or said fatty acids per se, in the presence of esterification catalysts and/or carboxylic acid anhydrides, to a brief temperature treatment above 150.degree. C., and separating simultaneously and/or subsequently, preferably by distillation, the purified lower alkyl esters of higher fatty acids or the purified higher fatty acids from the treated material and the purified higher fatty acids are then esterified with lower alkanols.

REFERENCES:
patent: 1981605 (1934-11-01), Schellmann
patent: 2486938 (1949-01-01), Fish
patent: 2583028 (1952-01-01), Terry et al.
patent: 2652414 (1953-09-01), Terry et al.
patent: 3526649 (1970-09-01), Naskar et al.
patent: 3531506 (1970-09-01), Naskar et al.
patent: 3833629 (1974-09-01), Naskar et al.
patent: 3836554 (1974-09-01), Naskar et al.
patent: 3840574 (1974-10-01), Naskar et al.
patent: 3864370 (1975-02-01), Yamashita et al.
patent: 4164506 (1979-08-01), Kawahara et al.
patent: 4303590 (1981-12-01), Tanaka et al.

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