Method of making bipolar junction transistor

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437162, 437149, 437150, 257526, 257586, 257592, H01L 218222

Patent

active

055696139

ABSTRACT:
A structural configuration and fabrication process of a bipolar junction transistor (BJT) semiconductor device having improved current gain. The fabrication process provides a P-type heavily-doped region underneath a P-type lightly-doped base region. The P-type heavily-doped region underneath the P-type lightly-doped base region prevents electron carriers from escaping from beneath the base region of the transistor, helping the collection in a collector of electron carriers emitted by an emitter of the BJT.

REFERENCES:
patent: 4883772 (1989-11-01), Cleeves et al.
patent: 5034338 (1991-07-01), Neppl et al.
patent: 5039624 (1991-08-01), Kadota
patent: 5455188 (1995-10-01), Yang
patent: 5478760 (1995-12-01), Yang

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making bipolar junction transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making bipolar junction transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making bipolar junction transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1785397

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.