Automated mask alignment for UV projection exposure system

Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing

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Details

356400, 356401, G03F 900

Patent

active

055695701

ABSTRACT:
A method of aligning an image at a desired position on a substrate support including providing a radiation source producing desired wavelengths of radiation. A fluorescing medium is provided on a substrate support. The radiation is directed toward the substrate support. At least one filter is positioned between the radiation source and the substrate support. A mask is positioned between the radiation source and the substrate support. The mask selectively transmits the radiation. The substrate support is irradiated with the radiation, thereby causing the fluorescing medium to fluoresce. A position of the radiation impacting upon the substrate support is detected with at least one detector by detecting an image of the fluorescing medium. A signal corresponding to the detected position of the radiation is produced. The detected position of the radiation is compared with a desired position of radiation impinging upon the substrate support to determine whether a deviation of the position of the radiation on the substrate support away from a desired position in a direction perpendicular to the radiation exists. A signal corresponding to comparison is produced. If a deviation exists, the position of the radiation source, the mask and the substrate support are altered relative to each other in accordance with the signal in the direction perpendicular to the radiation so as to cause the position of the radiation on the substrate support to substantially correspond to the desired position.

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