Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1986-04-18
1987-04-14
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20419212, C23C 1400
Patent
active
046576541
ABSTRACT:
A first target for a magnetron sputter device has a planar annular emitting surface bounded by an inner radius R1 and an outer radius R2. A second target has a concave emitting surface defined by a side wall of a frustum of a cone. The second target is limited by an inner radius R3 and outer radius R4. R3 is greater than R2. Each target element has pins in diametrically opposite holes to assist in holding the target elements in situ in bayonet slots in the sputter device. The targets are fit closely in cooling rings so that as the targets heat during operation, thermal expansion of the targets assists thermal conduction into the cooling rings.
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Cole Stanley Z.
Demers Arthur P.
Varian Associates Inc.
Warsh Kenneth L.
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