Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-09-21
1996-07-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430165, 430175, 430176, 430192, 430193, 4302811, 430177, G03F 7023
Patent
active
055366163
ABSTRACT:
A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also provides a method of making microelectronic structures.
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Frechet Jean M. J.
Lee Sze-Ming
Bowers Jr. Charles L.
Cornell Research Foundation Inc.
Young Christopher G.
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