Static induction transistor and integrated circuit utilizing sam

Electrical transmission or interconnection systems – Nonlinear reactor systems – Parametrons

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307458, 307477, 357 22, 357 23, 357 43, 357 50, 357 15, 357 92, H01L 2704, H03K 19091

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043171273

ABSTRACT:
A static induction type semiconductor device containing a normal type static induction transistor having the structure that a source region, gate regions and drain regions are arrayed in a main surface of a channel-constituting semiconductor region, and that a sub-drain region is formed in the opposite surface of the channel-constituting semiconductor region so as to extend from a position corresponding to the source region up to a position corresponding to the drain regions. The provision of this sub-drain region makes it possible to realize easy isolation of a normal vertical structure static induction transistor in a semiconductor wafer, the normal vertical structure contributing to increasing the transconductance, and to improving the speed of operation, without sacrificing a high packing density.

REFERENCES:
patent: 4032962 (1977-06-01), Balyoz et al.
patent: 4160918 (1977-12-01), Nazarian et al.
Nishizawa et al, Japanese J. of Applied Physics, vol. 16, supplement 16-1, pp. 151-154, (1977).

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