Apparatus and process to regenerate a trivalent chromium bath

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Treating process fluid by means other than agitation or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

205 99, 205287, 204DIG13, C25D 306, C01G 3700, B01J 3900

Patent

active

RE0357308

ABSTRACT:
A process and apparatus for regenerating a plating bath comprising trivalent chromium cations (a trivalent chromium bath). The bath can be continuously, or more preferably, periodically with an ion exchange resin, preferably a cation exchange resin. A useful apparatus comprises a plating tank containing a trivalent chromium plating bath in communication with an ion exchange bed continuing ion exchange resin.

REFERENCES:
patent: 2733204 (1956-01-01), Costa
patent: 3475163 (1969-10-01), Watson, Jr. et al.
patent: 3658470 (1972-04-01), Zievers et al.
patent: 3661732 (1972-05-01), Withrow
patent: 3903237 (1975-09-01), Smith et al.
patent: 3909372 (1975-09-01), Fujii
patent: 3998924 (1976-12-01), Jones et al.
patent: 4031038 (1977-06-01), Grinstead et al.
patent: 4038160 (1977-07-01), Crowther et al.
patent: 4432843 (1984-02-01), Tremmel
patent: 4448649 (1984-05-01), Barclay et al.
patent: 4702838 (1987-10-01), Babcock et al.
patent: 4963264 (1990-10-01), Davis
patent: 5002645 (1991-03-01), Eastland, Jr. et al.
patent: 5178746 (1993-01-01), Darnall et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and process to regenerate a trivalent chromium bath does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and process to regenerate a trivalent chromium bath, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and process to regenerate a trivalent chromium bath will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1774910

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.