1989-04-19
1990-02-27
Wojciechowicz, Edward J.
357 237, 357 54, 357 67, H01L 2978
Patent
active
049050664
ABSTRACT:
A thin-film transistor comprising a substrate, a gate electrode formed on said substrate and made of molybdenum-tantalum alloy containing 60 to 85 atomic % of tantalum gate insulation film formed on said gate electrode and made of a laminated layer including silicon nitride film and oxide film formed by oxidizing the surface of said gate electrode, semiconductor film formed on said gate insulation film and contacting the silicon nitride film, and source and drain electrodes formed on the semiconductor film.
REFERENCES:
patent: 4531144 (1985-07-01), Holmberg
Dohjo Masayuki
Ikeda Mitsushi
Oana Yasuhisa
Kabushiki Kaisha Toshiba
Wojciechowicz Edward J.
LandOfFree
Thin-film transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thin-film transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin-film transistor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-177374