Method of separating specific patterns from pattern space and ap

Image analysis – Histogram processing – For setting a threshold

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

395 21, G06K 900

Patent

active

052590399

ABSTRACT:
There is provided a pattern separation apparatus capable of separating patterns of a specific group from a plurality of patterns constituting a plurality of groups present in an n-dimensional pattern space in accordance with simple computational processing, the apparatus being used in a variety of applications such as recognition of characters, figures, and the like. An average of a set of patterns is calculated to be X.sub.av, and a vector closest to X.sub.av is defined as a key point and represented by X.sub.key, X.sub.key s chosen as the most central point. An n-dimensional space having X.sub.key as its center is assumed to calculate a main plane in which the number of patterns is larger than that of .largecircle. patterns. When other .largecircle. patterns are included in the main plane, a subplane is calculated to eliminate these patterns from the main plane. When other patterns are included in planes other than the main plane, a subplane for separating these patterns from the .largecircle. patterns and enclosing the patterns is calculated. The specific patterns are separated by the main plane and the subplanes.

REFERENCES:
patent: 5003490 (1991-03-01), Castelaz et al.
patent: 5048100 (1991-09-01), Kuperstein
patent: 5056147 (1991-10-01), Turner et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of separating specific patterns from pattern space and ap does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of separating specific patterns from pattern space and ap, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of separating specific patterns from pattern space and ap will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1763847

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.