Mask structure and exposure method and apparatus using the same

Details Mask structure and exposure method and apparatus using the same Mask structure and exposure method and apparatus using the same

1996-09-25

1998-12-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

378 35, G03F 900

Patent

active

058466762

ABSTRACT:
An X-ray mask structure is produced by a procedure including the steps of preparing a substrate having a surface provided thereon with an X-ray transmitting film, forming, on the substrate, one of a metal film and a multilayered film, having alkali resistivity, removing a predetermined limited portion of the metal film, bonding the substrate and a reinforcing member through the remaining metal film, by an anodic bonding process wherein the remaining metal film functions as an electrically conductive material in the anodic bonding process, etching the substrate with the remaining metal film functioning as an etching mask, to define an X-ray transmitting portion of the X-ray transmitting film and forming a mask pattern by use of an X-ray absorptive material.

REFERENCES:
patent: 4735877 (1988-04-01), Kato et al.
patent: 5413664 (1995-05-01), Yagi et al.
patent: 5422921 (1995-06-01), Chiba
patent: 5553110 (1996-09-01), Sentoku et al.
patent: 5589304 (1996-12-01), Chiba et al.

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