Device for applying thin layers onto a substrate

Details Device for applying thin layers onto a substrate Device for applying thin layers onto a substrate

1990-05-09

1993-06-29

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429809, 20429811, 20429814, C23C 1434

Patent

active

052231119

ABSTRACT:
One piece hollow members 6, 7 supported at the wall of the vacuum chamber 1 are provided parallel to the plane of the cathode 12 and in the area between the cathode 12 and the anode 4, 5. These members have axis-parallel conduits 6a, 6b, 6d, 7a, 7b, 7d passed through by both the temperature-regulating medium and the process gas. The hollow members 6, 7 have openings 6e, 6e', . . . , 7e, 7e', . . . which run transversely to the longitudinal axis of the conduits for the process gas to emerge into the vacuum chamber 1.

REFERENCES:
patent: 4412906 (1983-11-01), Sato et al.
patent: 4425218 (1984-01-01), Robinson
patent: 4572842 (1986-02-01), Dietrich et al.
patent: 4849087 (1989-07-01), Meyer
patent: 4946576 (1990-08-01), Dietrich et al.

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