Drying and gas or vapor contact with solids – Apparatus – Houses – kilns – and containers
Patent
1991-01-11
1993-06-29
Bennet, Henry A.
Drying and gas or vapor contact with solids
Apparatus
Houses, kilns, and containers
34229, 34 58, 432258, F26B 1900
Patent
active
052223108
ABSTRACT:
A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.
REFERENCES:
patent: 4313266 (1982-02-01), Tam
patent: 4339297 (1982-07-01), Aigo
patent: 4601627 (1986-07-01), Oka et al.
patent: 4788994 (1988-12-01), Shinbara
patent: 4936940 (1990-06-01), Kawasumi et al.
patent: 4938691 (1990-07-01), Ohkase et al.
Owczarz Aleksander
Thompson Raymon F.
Bennet Henry A.
Semitool Inc.
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