Exposure control system with inertial characteristic

Details Exposure control system with inertial characteristic Exposure control system with inertial characteristic

1975-05-05

1976-07-13

Hix, L. T.

354 29, 354235, 354256, G03B 908, G03B 958

Patent

active

039697380

ABSTRACT:
An exposure control system for photographic apparatus includes inertial means for selectively presenting an inertial characteristic to influence the movement of the exposure control system shutter blade elements. The inertial characteristic influences the rate of movement of the shutter blade elements toward their maximum aperture defining position without influencing the return movement of the shutter blade elements toward their closed position. The inertial means is also thereafter automatically reset in readiness for the next photographic cycle.

REFERENCES:
patent: 3251288 (1966-05-01), Kitai
patent: 3722392 (1973-03-01), Kitai
patent: 3856393 (1974-12-01), Ogihara et al.
patent: 3856393 (1974-12-01), Ogihara et al.
patent: 3873987 (1975-03-01), Brauning et al.

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