Method of producing a semiconductor device by simultaneous multi

Metal treatment – Compositions – Heat treating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29576B, 148187, 357 91, 427 531, H01L 21263, H01L 21265, H01L 2978

Patent

active

043759939

ABSTRACT:
A method of producing a semiconductor device which comprises steps of forming an insulator layer on a semiconductor substrate, forming a semiconductor layer on the insulator layer and then annealing the semiconductor layer by means of a first laser with a second laser being applied to the insulator layer to heat it while the first layer is applied to the semiconductor laser.

REFERENCES:
patent: 4229232 (1980-10-01), Kirkpatrick
patent: 4234356 (1980-11-01), Auston et al.
patent: 4249960 (1981-02-01), Schnable et al.
patent: 4272880 (1981-06-01), Pashley
patent: 4292091 (1981-09-01), Togei
patent: 4309224 (1982-01-01), Shibata
Ho et al., IBM-TDB, vol. 19, (Apr. 1977), 4438.
Cohen et al., Appl. Phys. Letts. 33, (Oct. 1978), 751.
Kamins et al., IEEE-Trans:Electron Devices, ED-27, (Jan. 1980), 290.
Tasch et al., Electron Letters, 15, (1979), 435.
Petersen, IBM-TDB, 22, (Apr. 1980), 5053.
Lam et al., IEEE-Electron Device Meeting, Wash., 1979, p. 213.
Fang et al., IBM-TDB, 23, (Jun. 1980), 362.
Shah et al., IEEE-Electron Device Meeting, Washington, 1979, p. 216.
Kamins et al., IEEE-Electron Device Letts. EDL-1, (Oct. 1980), p. 214.
Auston et al., Appl. Phys. Letts. 34, (1979), 558.
Hutchins et al., IBM-TDB, 15, (1974), 3488.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of producing a semiconductor device by simultaneous multi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of producing a semiconductor device by simultaneous multi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a semiconductor device by simultaneous multi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1733640

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.