Method of measuring misalignment between levels on a substrate

Details Method of measuring misalignment between levels on a substrate Method of measuring misalignment between levels on a substrate

1980-04-18

1985-07-16

Punter, William H.

Optics: measuring and testing

By polarized light examination

With light attenuation

356396, 356401, G01B 1114

Patent

active

045293147

ABSTRACT:
The numerical position relative to a reference indicia of two most nearly aligned overlapping indicia on two separate levels is multiplied by the difference in spacing of the indicia of the patterns on the two levels to determine the degree of misalignment of the levels.

REFERENCES:
patent: 3748043 (1973-07-01), Zipin
patent: 3861798 (1975-01-01), Kobayashi et al.
patent: 4074131 (1978-02-01), Schwebel
Russell et al., "A Comparison of Electrical & Visual Alignment Test Structures for Evaluating Photomask Alignment in Integrated Circuit Manufacturing", International Electron Devices Meeting: Tech. Digest, Wash. D.C., 1977, pp. 7A-7F.

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