Protective device for photographic masks

Details Protective device for photographic masks Protective device for photographic masks

1987-12-17

1989-05-23

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

269 8, 269 21, 335285, 355 76, G03F 900

Patent

active

048330515

ABSTRACT:
A protective device for photographic masks or reticles used in the photolithographic operation for fabricating semiconductor devices. The protective device includes a frame having a protective pellicle attached thereover and the frame includes temporary fastening means for detachably fastening the frame to a mask substrate. The temporary fastening is effected by using for example vacuum chucking, magnetic attractive force or spring force. The frame may be formed with vent holes each having a filter so that the internal pressure of the space enclosed by the pellicle and the frame on the mask is made equal to the outside air pressure.

REFERENCES:
patent: 3927943 (1975-12-01), Pohl et al.
patent: 4032233 (1977-06-01), Oscarsson et al.
patent: 4159176 (1979-06-01), de Maji
patent: 4255216 (1981-03-01), Conant et al.
patent: 4584216 (1986-04-01), Kenworthy et al.

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