Synthesis of ruthenium or osmium metathesis catalysts

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

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556 23, 556136, 502152, C07F 1500, C07F 902

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active

061537780

ABSTRACT:
The present invention relates to the synthesis of highly active ruthenium and osmium carbene metathesis catalyst in good yield from readily available starting materials. The catalysts that may be synthesized are of the general formula ##STR1## wherein: M is ruthenium or osmium;
X and X.sup.1 are independently any anionic ligand;
L and L.sup.1 are any neutral electron donor ligand; and,
R and R.sup.1 are each hydrogen or one of the following substituent groups: C.sub.2 -C.sub.20 alkenyl, C.sub.2 -C.sub.20 alkynyl, C.sub.1 -C.sub.20 alkyl, aryl, C.sub.1 -C.sub.20 carboxylate, C.sub.1 -C.sub.20 alkoxy, C.sub.2 -C.sub.20 alkenyloxy, C.sub.2 -C.sub.20 alkynyloxy, aryloxy, C.sub.2 -C.sub.20 alkoxycarbonyl, C.sub.1 -C.sub.20 alkylthio, C.sub.1 -C.sub.20 alkylsulfonyl and C.sub.1 -C.sub.20 alkylsulfinyl. Optionally, the substituent group may be substituted with one or more groups selected from C.sub.1 -C.sub.5 alkyl, halogen, C.sub.1 -C.sub.5 alkoxy, and aryl. When the substitute aryl group is phenyl, it may be further substituted witn one or more groups selected from a halogen, a C.sub.1 -C.sub.5 alkyl, or a C.sub.1 -C.sub.5 alkoxy. Specific synthetic protocols for vinyl alkylidene catalysts wherein R is hydrogen and R.sup.1 is --CHCR.sup.12 R.sup.13 and non-vinyl alkylidene catalysts are also disclosed. In addition to the ease of synthesis (typically a one-step synthesis), the reactions generally may be run at or above room temperature and the resulting products usually may be used without extensive post synthesis purification.

REFERENCES:
patent: 5554778 (1996-09-01), Beatty et al.
patent: 5689003 (1997-11-01), Beatty et al.
patent: 5726334 (1998-03-01), Beatty et al.
patent: 5831108 (1998-11-01), Grubbs et al.
patent: 5917071 (1999-06-01), Grubbs et al.
patent: 6048993 (2000-04-01), Grubbs et al.

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