Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1999-05-07
2000-11-28
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430905, 430909, G03F 7004
Patent
active
061533491
ABSTRACT:
A photoresist composition comprising a resin having structural units represented by the following formulas (I), (II) and (III): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.11, R.sup.12, R.sup.13, R.sup.21, R.sup.22 and R.sup.23 each independently represents hydrogen or an alkyl; one of R.sup.14, R.sup.15 and R.sup.16 represents an aliphatic hydrocarbon residue and the rest each independently represents hydrogen or an aliphatic hydrocarbon residue, or two or three of R.sup.14, R.sup.15 and R.sup.16 form a hydrocarbon ring; and R represents a group cleavable by an action of an acid; and the photoresist composition affords excellent resolution, excellent profile and wide focus margin even on a substrate provided with an organic anti-reflective film.
REFERENCES:
patent: 5558971 (1996-09-01), Urano et al.
Fukui Nobuhito
Ichikawa Koji
Ochiai Koshiro
Chu John S.
Sumitomo Chemical Company Limited
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