Apparatus for depositing barrier film on three-dimensional artic

Details Apparatus for depositing barrier film on three-dimensional artic Apparatus for depositing barrier film on three-dimensional artic

1996-09-30

1998-06-16

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118728, C23C 1600

Patent

active

057663629

ABSTRACT:
The invention relates to an apparatus for use in a Plasma Enhanced Chemical Vapor Deposition (PECVD) process whereby a coating of inorganic material is deposited on three-dimensional articles, including low melting temperature polymer articles. The coating possesses excellent gas and/or water vapor barrier properties.

REFERENCES:
patent: 3057795 (1962-10-01), Frohlich
patent: 4971667 (1990-11-01), Yamazaki et al.
patent: 5611862 (1997-03-01), Lee et al.

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