Semiconductor devices

Fishing – trapping – and vermin destroying

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437 33, 437228, 437233, 148DIG10, 357 34, 357 59, 156653, H01L 21265

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active

048493643

ABSTRACT:
A method of manufacturing a bipolar transistor (1) with semi-self-aligned p.sup.+ base contacts (27,27a). A p-type base region (28) is formed in a surface region of an n-type region 5 comprising a collector. An element (29) of, for example, n.sup.+ doped polycrystalline silicon, and comprising an emitter, is formed on the surface in contact with the base region (28). The base contacts (27,27a) are formed by implantation and using the element (29) as a mask. An n.sup.+ collector contact (25) is made to the n-tpe region (5).

REFERENCES:
patent: 3753807 (1983-08-01), Hoare et al.
patent: 3940288 (1976-02-01), Takagi et al.
patent: 4041518 (1977-08-01), Shimizu et al.
patent: 4188707 (1980-02-01), Asano et al.
patent: 4301588 (1981-11-01), Horng et al.
patent: 4437897 (1984-03-01), Kemlage
patent: 4452645 (1984-01-01), Chu et al.
patent: 4483726 (1984-11-01), Isaac et al.
patent: 4484388 (1984-11-01), Iwasaki
patent: 4495010 (1985-01-01), Kranzer
patent: 4507847 (1985-04-01), Sullivan
patent: 4523370 (1985-01-01), Sullivan et al.
patent: 4534806 (1984-08-01), Magdo
patent: 4563807 (1986-01-01), Sakai et al.
patent: 4604740 (1986-08-01), Bonn
"2 Micron . . . Technology" A. R. Alvarez et al., IEDM, 1984, pp. 761-764.
IEEE Journal of Solid-State Circuits, vol. SC-15, No. 4, Aug. 1980, p. 455-459, IEEE, New York, U.S. H. Nakashiba et al., "An Advanced PSA Technology for High Speed Bipolar LSI".
IEEE Electron Device Letters, vol. EDL-6, No. 6, Jun. 1985, p. 288-290, IEEE, New York, US. M. E. Rowlandson et al., "A True Polysilicon Emitter Transistor".
IEEE Transactions an Electron Devices, vol. ED-31, No. 7, Jul. 1984, p. 853-860, IEEE, New York, US. P. Ashburn et al., "Comparison of Experimental and Theoretical Results on Polysilicon Emitter Bipolar Transistors".

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