Semiconductor wafer heat treatment apparatus

Details Semiconductor wafer heat treatment apparatus Semiconductor wafer heat treatment apparatus

1994-04-21

1995-05-09

Paschall, Mark H.

Electric heating

Heating devices

With power supply and voltage or current regulation or...

219413, 219405, 219392, 219407, 392416, 432121, 432209, H05B 102

Patent

active

054142440

ABSTRACT:
A heat treatment apparatus according to the present invention includes a process tube which heat rays are able to penetrate, a holding member for holding an object to be treated in the process tube, two temperature regulation plates arranged opposite and close to the object held by the holding member, for regulating an amount of heat rays reaching to the object, a heating unit for heating the object in the process tube, a cooling unit for cooling the object heated by the heating unit, a temperature sensor for sensing temperatures of the two temperature regulation plates, and a controller for controlling the heating unit based on the temperature profile acquired in advance and the temperatures detected by the temperature sensor.

REFERENCES:
patent: 4081313 (1978-03-01), McKeilly et al.
patent: 4481406 (1984-11-01), Muka
patent: 4554437 (1985-11-01), Wagner et al.
patent: 5187771 (1993-02-01), Uchida
patent: 5308955 (1994-05-01), Watanabe
patent: 5324920 (1994-06-01), Nakao

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