Process for the formation of an amorphous silicon deposited film

Details Process for the formation of an amorphous silicon deposited film Process for the formation of an amorphous silicon deposited film

1992-05-26

1994-02-22

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437233, 437967, H01L 2120

Patent

active

052886581

ABSTRACT:
A process for forming a silicon-containing amorphous film on a substrate which comprises (a) step of depositing a silicon-containing amorphous film on said substrate and (b) step of irradiating plasma of inert gas to said silicon-containing amorphous film on deposited on the substrate in said step (a), wherein said step (a) and said step (b) are alternately repeated.

REFERENCES:
patent: 5049523 (1991-09-01), Coleman
patent: 5108778 (1992-04-01), Suzuki et al.

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