Insulated gate semiconductor device having a cavity under a port

Fishing – trapping – and vermin destroying

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437 41, 437 44, 437 45, H01L 21265, H01L 2170, H01L 2700

Patent

active

056122446

ABSTRACT:
An insulated gate field effect transistor (10) having an reduced gate to drain capacitance and a method of manufacturing the field effect transistor (10). A dopant well (13) is formed in a semiconductor substrate (11). A gate oxide layer (26) is formed on the dopant well (13) wherein the gate oxide layer (26) and a gate structure (41) having a gate contact portion (43) and a gate extension portion (44). The gate contact portion (43) permits electrical contact to the gate structure (41), whereas the gate extension portion (44) serves as the active gate portion. A portion of the gate oxide (26) adjacent the gate contact portion (43) is thickened to lower a gate to drain capacitance of the field effect transistor (10) and thereby increase a bandwidth of the insulated gate field effect transistor (10).

REFERENCES:
patent: 4619038 (1986-10-01), Pintchovski
patent: 4949136 (1990-08-01), Jain
patent: 4968639 (1990-11-01), Bergonzoni
patent: 5170232 (1992-12-01), Narita
patent: 5372960 (1994-12-01), Davies et al.
patent: 5374575 (1994-12-01), Kim et al.
patent: 5391508 (1995-02-01), Matsuoka et al.
patent: 5427964 (1995-06-01), Kaneshiro et al.

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