Thin film semiconductor device and process for producing thereof

Details Thin film semiconductor device and process for producing thereof Thin film semiconductor device and process for producing thereof

1992-04-27

1993-12-14

Wilczewski, Mary

Fishing, trapping, and vermin destroying

437101, 205102, 205103, 205106, 205333, 205915, H01L 21336, H01L 21283, H01L 2712

Patent

active

052702294

ABSTRACT:
A thin film semiconductor device comprising a semiconductor layer and an electrically conductive thin film which are formed by an alternate current plating method, and a process for producing thereof.

REFERENCES:
patent: 3577326 (1971-05-01), Liebschutz
patent: 3627647 (1971-12-01), Reuter et al.
patent: 3714633 (1973-01-01), Epstein et al.
patent: 3770594 (1973-11-01), Mentone
patent: 3802854 (1974-04-01), Mueller-Dittmann et al.
patent: 3807037 (1974-04-01), Fischer
patent: 3959088 (1976-05-01), Sullivan
patent: 3990953 (1976-11-01), Austin
patent: 4040073 (1977-08-01), Luo
patent: 4082626 (1978-04-01), Hradcovsky
patent: 4086101 (1978-04-01), Jordan et al.
patent: 4113578 (1978-09-01), Del Monte
patent: 4140596 (1979-02-01), Wobking
patent: 4145262 (1979-03-01), Tijburg et al.
patent: 4167805 (1979-09-01), Castel
patent: 4192720 (1980-03-01), Bucker et al.
patent: 4204933 (1980-05-01), Barlow et al.
patent: 4208254 (1980-06-01), Mitsumoto et al.
patent: 4248675 (1981-02-01), Bozler et al.
patent: 4335161 (1982-06-01), Luo
patent: 4425572 (1984-01-01), Takafuji et al.
patent: 4496436 (1985-01-01), Inoue
patent: 4581108 (1986-04-01), Kapur et al.
patent: 4704559 (1987-11-01), Suginoya et al.
patent: 4759610 (1988-07-01), Yanagisawa
patent: 4764261 (1988-08-01), Ondris et al.
patent: 4773973 (1988-09-01), Gruniger et al.
patent: 4778560 (1988-10-01), Takeda et al.
patent: 4816120 (1989-03-01), Ondris et al.
patent: 4931661 (1990-06-01), Fukaya et al.
Sharma et al., "Electroless Deposition of Semiconductor Films", Thin Solid Films, vol. 60, No. 1, 1979, pp. 55-59.
J. Electrochem. Soc., vol. 128, p. 1221 (1981), Y. Takeda et al., "Cathodic Deposition of Amorphous Silicon from Tetraethylorthosilcate in Organic Solvents".

Affiliated with

Also associated with

Rating

Thin film semiconductor device and process for producing thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thin film semiconductor device and process for producing thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thin film semiconductor device and process for producing thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1704935