Method and apparatus for semiconductor device fabrication diagno

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437173, G01J 116, H01L 21268

Patent

active

052702227

ABSTRACT:
A sensor (210) for diagnosis and prognosis of semiconductor device fabrication processes measures specular, scattered, and total surface reflectances and transmittances of semiconductor wafers (124). The sensor (210) comprises a sensor arm (212) and an opto-electronic control box (214), for directing coherent electromagnetic or optical energy in the direction of semiconductor wafer (124). Opto-electronic control box (214) includes circuitry for measuring the amounts of laser powers coherently reflected from and transmitted through the semiconductor wafer (124) surface and the amounts of electromagnetic powers scatter reflected from and transmitted through the semiconductor wafer (124) surface. The present invention determines specular, scattered, and total reflectance and transmittance as well as surface roughness values for semiconductor wafer (124) based on measurements of coherent and scatter reflected and transmitted laser powers. The sensor (210) of the present invention can also provide a go
o-go test of semiconductor fabrication process quality. A process control computer associates with the sensor (210) to respond to spectral reflectance and transmittance measurements yielding surface roughness and thickness measurements as well as diagnosis/prognosis analysis results and control signals.

REFERENCES:
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 5091320 (1992-02-01), Aspnes et al.
Gambino et al., "Microcircuit Processing Control by Optical Diffraction," IBM Tech. Disc. Bull., vol. 20, No. 2, Jul. 1977, pp. 781-783.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for semiconductor device fabrication diagno does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for semiconductor device fabrication diagno, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for semiconductor device fabrication diagno will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1704835

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.