Silver halide photographic material

Details Silver halide photographic material Silver halide photographic material

1989-11-03

1991-09-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Post imaging processing

Developing

430567, 430604, 430605, G03C 524

Patent

active

050513443

ABSTRACT:
There is disclosed a silver halide photographic material comprising a support having provided thereon at least one silver halide photosensitive emulsion layer, wherein said silver halide photosensitive emulsion layer contains silver iodobromide grains having a silver iodide content of 0.1 to 4.0 mol %, said grains containing 5.times.10.sup.-9 to 1.times.10.sup.-6 mole of an iridium compound and 5.times.10.sup.-8 to 1.times.10.sup.-3 mole of an iron compound per mole of the silver halide in said silver iodobromide grains, and a method for forming an image comprising the silver halide photographic meterial to a high-irradiation short-duration exposure followed by development. The photographic material has high speed, high contrast and is outstanding in handling properties under a safelight.

REFERENCES:
patent: 4588678 (1986-05-01), Ikeda
patent: 4613563 (1986-09-01), Murai
patent: 4639416 (1987-01-01), Yoshida et al.
patent: 4692400 (1987-09-01), Kumashiro et al.
patent: 4713318 (1987-12-01), Sugimoto et al.
patent: 4728602 (1988-03-01), Shibahara et al.
patent: 4806462 (1989-02-01), Yamashita et al.
patent: 4857450 (1989-08-01), Burrows et al.
patent: 4963467 (1990-10-01), Ishikawa et al.
patent: 4983509 (1991-01-01), Inoue et al.

Affiliated with

Also associated with

Rating

Silver halide photographic material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silver halide photographic material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silver halide photographic material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1696272