Patent
1988-12-28
1990-08-21
Wojciechowicz, Edward J.
357 35, 357 55, 357 68, H01L 2972
Patent
active
049511084
ABSTRACT:
The invention relates to an integrated circuit having a lateral transistor, whose emitter region has a depth and a doping level such that the diffusion length of the minority charge carriers vertically injected into this region is greater than or equal to the thickness of the said region, the ratio between the surface of the emitter region and that of the electrical connection emitter zone being at least equal to 20. The current amplification .beta. of such a transistor is considerably increased by giving the emitter region an elongate shape in a longitudinal direction, the ratio between the largest longitudinal dimension and the largest transversal dimension being at least equal to 5.
REFERENCES:
patent: 4231059 (1980-10-01), Hower et al.
patent: 4654687 (1987-03-01), Hebert
Biren Steven R.
U.S. Philips Corp.
Wojciechowicz Edward J.
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