Coating apparatus – Gas or vapor deposition – With treating means
Patent
1990-04-13
1992-07-28
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118726, C23C 1424
Patent
active
051332868
ABSTRACT:
A substrate-heating device and a boat structure for a vacuum depositing apparatus that is capable of depositing semiconductor film onto a substrate more uniformly. The substrate-heating device includes a plurality of divided heating blocks which are capable of detecting and controlling their respective temperatures separately and independently. The substrate-heating device further includes a plurality of substrate holders for holding substrates, these substrate holding being driven by motor, through a transmission gear, a plurality of divided heating blocks for heating substrates, and boat structure for evaporating the depositing material within a vacuum chamber. The heating blocks, except a top portion, are structured with C-G heaters, ceramic tubes, heat-conductive protecting support plates and heat-radiating conductive plate, as well as thermocouples, so that temperature differences among each portion of the heating blocks can be controlled separately and independently so that more uniform depositing of semiconductor film onto the substrates can be obtained.
REFERENCES:
patent: 3281517 (1966-10-01), Hemmer
patent: 3333982 (1967-08-01), Horn
patent: 4217856 (1980-08-01), Kraus
Choo Dhe H.
Song Ie H.
Bueker Richard
Samsung Electro-Mechanics Co. Ltd.
LandOfFree
Substrate-heating device and boat structure for a vacuum-deposit does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Substrate-heating device and boat structure for a vacuum-deposit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate-heating device and boat structure for a vacuum-deposit will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1681799