Electrophotographic photosensitive member containing amorphous s

Details Electrophotographic photosensitive member containing amorphous s Electrophotographic photosensitive member containing amorphous s

1987-01-14

1987-11-03

Welsh, J. David

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430132, G03G 508

Patent

active

047043431

ABSTRACT:
An electrophotographic photosensitive member has high sensitivity with respect to long-wavelength light, since it is formed of amorphous silicon containing hydrogen. A surface layer has excellent charge-retaining properties, since it is formed of microcrystalline silicon containing at least one element selected from the group consisting of carbon, nitrogen, and oxygen. A barrier layer is formed of boron nitride or of microcrystalline silicon containing at least one element selected from among those of Group III or V of the periodic table. The BN barrier layer has high resistivity and high blocking properties. The .mu.c-Si barrier layer is of p-type or n-type, due to the doping of a Group III or V element, and has a rectifying function.

REFERENCES:
patent: 4560634 (1985-12-01), Matsuo et al.
patent: 4582773 (1986-04-01), Johncock

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