Coating processes – Coating by vapor – gas – or smoke – Metal coating
Patent
1998-09-18
2000-03-14
King, Roy V.
Coating processes
Coating by vapor, gas, or smoke
Metal coating
427576, 427573, 427314, 42725523, 42725528, 427124, 4272557, C23C 1600
Patent
active
060370017
ABSTRACT:
A method for depositing copper-based films and a copper source precursor for use in the chemical vapor deposition of copper-based films are provided. The precursor includes a mixture of at least one ligand-stabilized copper (I) .beta.-diketonate precursor; and at least one copper(II) .beta.-diketonate precursor. The method includes introducing into a deposition chamber: (i) a substrate; (ii) a copper source precursor in a vapor state including a mixture of at least one ligand-stabilized copper (I) .beta.-diketonate precursor; and at least one copper(II) .beta.-diketonate precursor; and (iii) at least one transport gas, different than said copper source precursor. The reaction substrate temperature is maintained at from about 50.degree. C. to about 500.degree. C. for a period of time sufficient to deposit a copper-based film on said substrate.
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Arkles Barry C.
Kaloyeros Alain E.
Gelest Inc.
King Roy V.
The Research Foundation of State University of New York
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